Double Exposure Artist Residency 2019 – until 18 November 2018

Deadline: 18 November 2018. PhotoAccess is excited to launch the second edition of DOUBLE EXPOSURE, a supported artist residency program offering one interstate or international photo-based artist a five-week opportunity to produce new work, using PhotoAccess’ Darkroom and facilities.

DOUBLE EXPOSURE supports the creation of new and innovative still and or moving photo-based work. Priority will be given to artists who work experimentally using darkroom-based processes. The successful artist will receive a stipend, materials allowance, a contribution towards travel expenses, accommodation at EAST Hotel and extended access to PhotoAccess’ specialised darkroom, film developing and digital facilities. This opportunity also includes a solo exhibition in the PhotoAccess Huw Davies Gallery in November 2019.

The artist will also be required to participate in a ‘Meet the Artist or Artist in Conversation’ public program hosted by Joe’s Bar & EAST Hotel during their stay.

This is a five-week supported residency opportunity open to Australian and International artists at all stages of their career to spend dedicated time creating a new body of work. You get:

*A residency from 22 July – 2 September 2019
This is your time to experiment, innovate and create!

*A generous stipend
To help you to live whilst you create new work

*A materials stipend
We know art & photography materials are expensive!

*A contribution towards travel expenses
To get you here on a big jet plane! (or in a car)

*Accommodation at EAST Hotel
So you will be well rested during your stay

*Extended access to PhotoAccess’ specialised darkroom, film developing & digital facilities
Because inspiration can strike at any hour!

*A solo exhibition in the Huw Davies Gallery from 7 – 23 November 2019
To show everyone what you have created

*A Contribution towards exhibition costs
We know they are expensive, and we want to help

Contest website: